An edition of Optical and dimensional-measurement problems with photomasking in microelectronics (1975)

Optical and dimensional-measurement problems with photomasking in microelectronics

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Optical and dimensional-measurement problems ...
John M. Jerke
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Last edited by Open Library Bot
December 5, 2010 | History
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An edition of Optical and dimensional-measurement problems with photomasking in microelectronics (1975)

Optical and dimensional-measurement problems with photomasking in microelectronics

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  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Language
English
Pages
36

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Subjects
Integrated circuits, Masks, Optical measurements, Photolithography
Edition Availability
Cover of: Optical and dimensional-measurement problems with photomasking in microelectronics
Optical and dimensional-measurement problems with photomasking in microelectronics
1975, U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
in English
  • Not in Library

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Book Details

Edition Notes

Bibliography: p. 31-36.

Published in
Washington
Series
Semiconductor measurement technology, NBS special publication ; 400-20, NBS special publication ;, 400-20.

Classifications

Dewey Decimal Class
389/.08 s, 621.381/73
Library of Congress
QC100 .U57 no. 400-20, TK7874 .U57 no. 400-20

The Physical Object

Pagination
iv, 36 p. :
Number of pages
36

ID Numbers

Open Library
OL4855493M
LCCN
75619190

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History

Download catalog record: RDF / JSON
December 5, 2010 Edited by Open Library Bot Added subjects from MARC records.
December 10, 2009 Created by WorkBot add works page